Our Expertise – Our Experience
MICROWAVE PLASMA SOURCE TECHNOLOGY
- Deposition of ceramic and organic layers or hybrids
- High deposition rates up to plasma densities of 1012 cm-3
- Extended production cycles through advanced plasma source design
- Wide operational pressure range (10-3 mbar to 10 mbar)
DIAMOND DEPOSITION
- Fully automated PECVD systems
- Substrate stage - heated or cooled with z axis drives and rotation
- Substrate temperature can be varied between 200°C and 750°C
- Plasma source - layout as linear array, single or dual mode cavity
PVD - MAGNETRON SPUTTERING
- Planar and rotating cathode technology
- Access to intelligent DC – MF and RF, unipolar and bipolar power supplies
- Customized target design