Large area PECVD of Diamond thin films

Please download Large area microwave PECVD of diamond thin films PDF (1 MB).
Methods of depositing diamond thin films over large areas
By W&L Coating Systems GmbH



Please download W&L PECVD PDF (3,3 MB).

Plasma Enhanced Chemical Vapour Deposition
Principles, strengths and weaknesses
By W&L Coating Systems GmbH


NCS 3-150

Please downloadNCS3-150 PDF (251 KB).

The NCS 3-150 is a revolutionary new MW Plasma CVD deposition system for low temperature growth of diamond and graphene based films. This system enables poly crystalline diamond compatible thin film growth over a very broad range of materials for device integration, biocompatible coatings and other advanced applications.


Research and development


The robust resources provided by our know-how base and expert networks in vacuum coating enables us to offer research and development solutions for a wide range of competitive functional and exotic coating processes and materials. We undertake exclusive development projects on our in-house platforms which offer customers alternatives as well as efficient economic facilities.

Improving thin films


We provide mainstream thin film analysis based on mechanical and optical methods for quality analysis and improvement assessments. Maintaining specified thin film properties during production is important to our customers and their end users.



We offer fabricators a specialist support service to increase productivity within their existing production equipment. We propose improvements to increase yields and offer positive cost-of-ownership reduction measures.

Coating Technology


We design and construct specific platforms and advanced coating tools for specified surface processes offering magnetron sputtering and plasma enhanced chemical vapour deposition (PECVD). Our technology is provided as original systems as well as implementing upgrades for new processes in existing systems.