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We will be presenting our new and competitve boron doped diamond electrode and cell technology for wastewater treatment at the ACHEMA 2024 in Frankfurt from 10th to 14th of June. Please visit our booth C77 in Hall 11.0.

Planar arrays of variable numbers of linear plasma sources in parallel arrangements powered by microwaves are the preferred approach for large scale production of thin films like nano crystalline diamond

Usually this system platform consists of a number of aluminium frames and flanges with built in water cooling which carry process gas supply pipes, the plasma source array, the substrate carrier unit and vacuum pumping ports.

Magnetic fields by permanent magnets in a special arrangement define the shape of plasma discharges powered by electric or electromagnetic power close to target surfaces to be sputtered. Usually, sputter plasma discharges have the shape of so called closed race tracks. Argon ions from the plasma are accelerated towards the target to create a vapor of target material which will condense and form thin films on substrates.

Magnetron sputter cathodes with tube targets have widely replaced planar versions. The tube targets rotate during the sputter process offering superior advantages over planar sputter magnetrons in terms of deposition rates, material utilization and profitability.